Broadband antireflection subwavelength gratings for polymethyl methacrylate fabricated with molding technique

被引:29
作者
Kanamori, Y [1 ]
Hane, K [1 ]
机构
[1] Tohoku Univ, Dept Mechatron & Precis Engn, Venture Business Lab, Aoba Ku, Sendai, Miyagi 9808579, Japan
关键词
subwavelength grating; antireflection; mold; polymethyl methacrylate; micromachining; rigorous coupled-wave analysis;
D O I
10.1007/s10043-002-0183-0
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We fabricated a two-dimensional subwavelength grating (SWG) on a polymethyl methacrylate (PMMA) film using a molding technique. A method of fabricating SWGs with high accuracy using a replica technique in an atmospheric environment was proposed. The SWG consisted of tapered gratings with a 200 nm period and a 200 nm deep groove. The reflectivity at wavelengths from 400 nm to 800 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis. At these wavelengths, the reflectivity decreased to approximately half that of the PMMA film.
引用
收藏
页码:183 / 185
页数:3
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