Nanoparticles and Thin Film Formation in Ultrashort Pulsed Laser Deposition of Vanadium Oxide

被引：38

作者：

Teghil, Roberto ^{[1
]}

D'Alessio, Luciano ^{[1
]}

De Bonis, Angela ^{[1
]}

Galasso, Agostino ^{[1
]}

Ibris, Neluta ^{[1
]}

Salvi, Anna Maria ^{[1
]}

Santagata, Antonio ^{[2
]}

Villani, Patrizia ^{[1
,2
]}

机构：

[1] Univ Basilicata, Dipartimento Chim, I-85100 Potenza, Italy

[2] CNR, IMIP, Unita Operat Potenza, I-85050 Tito, PZ, Italy

来源：

JOURNAL OF PHYSICAL CHEMISTRY A | 2009年 / 113卷 / 52期

关键词：

ABLATION DEPOSITION; SPECTROSCOPY; GENERATION; EMISSION; GROWTH; V4O10; VO2;

D O I：

10.1021/jp9050947

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The ultrashort pulsed laser deposition of vanadium oxide thin films has been carried out by a frequency-doubled Nd:glass laser with a pulse duration of 250 fs. The characteristics of the plasma produced by the laser-target interaction have been studied by ICCD imaging and optical emission spectroscopy. The results confirm that an emitting plasma produced by Ultrashort laser pulses is formed by both a primary and a secondary component. The secondary component consists of particles with a nanometric size, and their composition and spatial angular distribution influence the deposited films. In fact, these films, analyzed by X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscopy, and atomic force microscopy, are formed by the aggregation of a large number of nanoparticles whose composition is explained by a model based on equilibrium thermal evaporation from particles directly ejected from the target. On these basis, the presence in the films of a mixture of V2O5 and VO2 is discussed.

引用

页码：14969 / 14974

页数：6

共 37 条

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