Ordered mesoporous silica and alumina thin films studied by X-ray scattering

被引：6

作者：

Klotz, M ^{[1
]}

Idrissi-Kandri, N ^{[1
]}

Ayral, A ^{[1
]}

van der Lee, A ^{[1
]}

Guizard, C ^{[1
]}

机构：

[1] Univ Montpellier 2, UMR 5635 CNRS, Inst Europeen Membranes, F-34095 Montpellier 5, France

来源：

JOURNAL DE PHYSIQUE IV | 2002年 / 12卷 / PR6期

关键词：

D O I：

10.1051/jp4:20020237

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The use of X-ray techniques for the characterisation of ordered mesoporous films is demonstrated. Both silica and alumina thin layers with an ordered mesoporosity are studied using low-angle diffraction and grazing incidence reflectometry. It is shown how the internal structure evolves upon drying and how texture can be easily detected using a two-circle diffractometer. The reflectometry data are correlated with results from nitrogen adsorption/desorption experiments.

引用

页码：283 / 289

页数：7

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