Quantitative comparison of image contrast and pattern between experimental and simulated high-resolution transmission electron micrographs

被引:27
作者
Du, K. [1 ]
von Hochmeister, K. [1 ]
Phillipp, F. [1 ]
机构
[1] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
关键词
high-resolution transmission electron microscopy; image simulation;
D O I
10.1016/j.ultramic.2006.08.003
中图分类号
TH742 [显微镜];
学科分类号
摘要
Aiming to determine the contrast mismatch factor i.e. the Stobbs factor between the experimental and simulated high-resolution transmission electron micrographs, we have systematically compared the experimental images and simulations of a cleaved silicon sample for a series of focal settings and specimen thicknesses. For zero-loss energy filtered images, a mismatch factor of about 1.5-2.3 is measured for the image contrast, where the mismatch factor is focal dependent and higher mismatch appears around the focus value of 10 rim. Attention is also given to the effects of the sample vibration and drift to the image contrast and pattern of the high-resolution micrographs. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:281 / 292
页数:12
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