Nickel deposition in the presence of coumarin - An electrochemical impedance spectroscopy study

被引:36
作者
Cheng, CC
West, AC
机构
[1] Dept. Chem. Eng., Mat. Sci., M., Columbia University, New York
关键词
D O I
10.1149/1.1837957
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
An electrochemical impedance spectroscopy study of nickel deposition onto a rotating disk from a coumarin-containing Watts bath is presented. A model that assumes (i) adsorption of coumarin follows a Langmuir isotherm, (ii) that coumarin is consumed by incorporation into the deposit, and (iii) that metal-ion intermediates compete with the leveling agent for surface sites is presented and shown to be in reasonable accord with experiment. However, discrepancies in the spectra may provide a more reliable means of determining kinetic parameters for the description of leveling agents than steady-state polarization experiments is also discussed.
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页码:3050 / 3056
页数:7
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