Monitoring the deposition of Cu thin film using the double exposure holographic interferometry technique

被引:4
作者
Dongre, MB
Fulari, VJ
Kulkarni, HR
机构
[1] Holographic Laboratory, Department of Physics, Shivaji University
关键词
deposition process; surface defects; copper;
D O I
10.1016/S0040-6090(96)09599-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The double exposure holographic interferometry (DEHI) technique is used to study the surface deformation of stainless steel plate when Cu is deposited onto it using the electrodeposition method. Cu(NO3)(2) solutions of different normalities were used for deposition and the steel plate was exposed for different intervals of time. It is observed that the fringe spacing changes with the concentration of the solution as well as the time of deposition. This effect is due to the increase in thickness of Cu films. An attempt has been made to measure the thickness and mass of deposited films by DEHI technique.
引用
收藏
页码:62 / 64
页数:3
相关论文
共 7 条
[1]   APPLICATION OF MOIRE TECHNIQUES TO HOLOGRAPHY (LASER LIGHT STRAIN SURFACE STUDIES DIFFRACTION INTERFEROMETRY E/T) [J].
COLLIER, RJ ;
DOHERTY, ET ;
PENNINGTON, KS .
APPLIED PHYSICS LETTERS, 1965, 7 (08) :223-+
[2]  
COLLIER RJ, 1971, OPTICAL HOLOGRAPHY, P423
[3]   SURFACE-DEFORMATION MEASUREMENT USING WAVEFRONT RECONSTRUCTION TECHNIQUE [J].
HAINES, KA ;
HILDEBRAND, BP .
APPLIED OPTICS, 1966, 5 (04) :595-+
[4]  
MARON E, 1976, APPL HOLOGRAPHY OPTI, V2, P26
[5]   HOLOGRAPHISCHE INTERFEROMETRIE DIFFUS REFLEKTIERENDER OBJEKTE [J].
NASSENSTEIN, H .
PHYSICS LETTERS, 1966, 21 (03) :290-+
[6]  
PAWAR SH, 1993, INT C EN ENV EL KAR
[7]  
STROKE GW, 1969, INTRO COHERENT OPTIC, P202