Mechanistic studies on the repair of a novel DNA photolesion: The spore photoproduct

被引：51

作者：

Mehl, RA ^{[1
]}

Begley, TP ^{[1
]}

机构：

[1] Cornell Univ, Dept Chem & Chem Biol, Ithaca, NY 14853 USA

来源：

ORGANIC LETTERS | 1999年 / 1卷 / 07期

关键词：

D O I：

10.1021/ol9908676

中图分类号：

O62 [有机化学];

学科分类号：

070303 ; 081704 ;

摘要：

[GRAPHICS] UV irradiation of spores results in the formation of the spore photoproduct. This novel DNA photolesion is repaired in the germinating spore in a reaction catalyzed by the spare photoproduct lyase, Model studies, using a simple bispyrimidine, suggest that this repair reaction proceeds by hydrogen abstraction from C6 of the spore photoproduct followed by beta-scission of the bond linking the two pyrimidines and back hydrogen atom transfer.

引用

页码：1065 / 1066

页数：2

共 9 条

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