Preparation of superhydrophobic silicon oxide nanowire surfaces

被引:105
作者
Coffinier, Yannick
Janel, Sebastien
Addad, Ahmed
Blossey, Ralf
Gengembre, Leon
Payen, Edmond
Boukherroub, Rabah
机构
[1] IRI, FRE 2963, F-59652 Villeneuve Dascq, France
[2] CNRS, UMR 8520, IEMN, F-59652 Villeneuve Dascq, France
[3] Univ Lille 1, Lab Struct & Proprietes Etat Solide, UMR 8008, CNRS, F-59655 Villeneuve Dascq, France
[4] Univ Lille 1, Catalyse Lab, Unite Catalyse & Chim Solide, UMR 8181,CNRS, F-59655 Villeneuve Dascq, France
关键词
FILMS; WETTABILITY; FABRICATION; TRANSISTORS; NANOTUBES; CHEMISTRY; POLYMER; SI;
D O I
10.1021/la063345p
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The paper reports on the preparation of superhydrophobic amorphous silicon oxide nanowires (a-SiONWs) on silicon substrates with a contact angle greater than 150 degrees by means of surface roughness and self-assembly. Nanowires with an average mean diameter in the range 20-150 nm and 15-20 mu m in length were obtained by the so-called solid-liquid-solid (SLS) technique. The porous nature and the high roughness of the resulting surfaces were confirmed by AFM imaging. The superhydrophobicity resulted from the combined effects of surface roughness and chemical modification with fluorodecyl trichlorosilane.
引用
收藏
页码:1608 / 1611
页数:4
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