Two-dimensional distribution of As atoms doped in a Si crystal by atomic-resolution high-angle annular dark field STEM

被引:41
作者
Yamazaki, T
Watanabe, K
Kikuchi, Y
Kawasaki, M
Hashimoto, I
Shiojiri, M
机构
[1] Sci Univ Tokyo, Dept Phys, Shinjuku Ku, Tokyo 1628601, Japan
[2] Tokyo Metropolitan Coll Technol, Shinagawa Ku, Tokyo 1400011, Japan
[3] Fujitsu Labs Ltd, Mat & Mat Engn Labs, Atsugi, Kanagawa 2430197, Japan
[4] JEOL Ltd, Electron Opt Div, Akishima, Tokyo 1968558, Japan
[5] Sci Univ Tokyo, Dept Phys, Shinjuku Ku, Tokyo 1628601, Japan
[6] Kanazawa Med Univ, Dept Anat, Ishikawa 9200293, Japan
[7] Kyoto Inst Technol, Kyoto 6068585, Japan
关键词
D O I
10.1103/PhysRevB.61.13833
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Observation of arsenic doped silicon has been made by using Z-contrast images of high-angle annular dark held scanning transmission electron microscopy with a tightly focused electron probe. The images show characteristic excess brightness depending on the number of arsenic atoms per atomic column. Through a simple analysis capable of identifying the number of arsenic atoms in an atomic column by using the above characteristic brightness, the quantitative two-dimensional distribution of arsenic atoms can be successfully obtained at atomic resolution, being consistent with the secondary ion mass spectroscopy and Rutherford backscattering spectroscopy measurements. This method is the only capable technique for detecting impurity atoms in every atomic column.
引用
收藏
页码:13833 / 13839
页数:7
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