Electronic structure and energy band gap of poly (9,9-dioctylfluorene) investigated by photoelectron spectroscopy

被引:76
作者
Liao, LS [1 ]
Fung, MK
Lee, CS
Lee, ST
Inbasekaran, M
Woo, EP
Wu, WW
机构
[1] City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
[2] City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
[3] Fudan Univ, Surface Phys Lab, Shanghai 200433, Peoples R China
[4] Dow Chem Co, Cent & New Businesses R&D, Midland, MI 48674 USA
关键词
D O I
10.1063/1.126713
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electronic structure of poly (9,9-dioctylfluorene) (PFO) film on a Au-coated Si substrate was investigated by ultraviolet photoelectron spectroscopy (UPS) and x-ray photoelectron spectroscopy (XPS). From the UPS measurement, we obtained the ionization potential (Ip) of the PFO film, Ip = 5.60 +/- 0.05 eV. From the XPS shake-up peaks of the C1s core level, we estimated the electron energy band gap (E-g) of the film, E-g = 3.10 +/- 0.10 eV. By comparing the E-g with the optical absorption gap, we found that the value of E-g is closer to the optical absorption maximum than to the optical absorption edge. Therefore, we suggest that the optical absorption maximum may be a better approximation than the optical absorption edge in estimating E-g. (C) 2000 American Institute of Physics. [S0003-6951(00)00924-4].
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页码:3582 / 3584
页数:3
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