Modeling assessment of the side writing properties of a notch write head.

被引:13
作者
Chang, T
机构
[1] IBM (N17A/014), San Jose, CA 95193
关键词
D O I
10.1109/20.617750
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The side writing properties of a notch write head is studied via 3-D finite element method modeling. The head field properties are characterized by the erase width, track edge write gradient, and edge transition shift position. The calculated head field of the notch head are compared to the calculated values for a trimmed and merged head. The results show a significant decrease in the erase width at small notch depths of less than 1 gap length. However, the improved edge transition profiles associated with the trimmed head are not realized until the notch depth exceeds approximately 2 gap lengths.
引用
收藏
页码:2842 / 2844
页数:3
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