Contamination and degradation of 157nm stepper optical components - Field experience at International SEMATECH

被引：5

作者：

Meute, J ^{[1
]}

Rich, G ^{[1
]}

Hien, S ^{[1
]}

Dean, K ^{[1
]}

Gondran, C ^{[1
]}

Cashmore, J ^{[1
]}

Ashworth, D ^{[1
]}

Webb, J ^{[1
]}

Rich, L ^{[1
]}

Dewa, P ^{[1
]}

机构：

[1] Int SEMATECH, Austin, TX 78741 USA

来源：

OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2 | 2002年 / 4691卷

关键词：

photocontamination; airborne molecular contamination; optics purge gas; 157 nm optics lifetime;

D O I：

10.1117/12.474621

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Significant improvement in 157nm optical components lifetime is required for successful implementation of pilot and production scale 157nm lithography. To date, most of the 157nm optics lifetime data has been collected in controlled laboratory conditions by introducing predetermined concentrations of contaminants and monitoring degradation in terms of transmission loss. This publication compliments prior work by documenting field experience with the 157nm Exitech Microstepper currently in operation at International SEMATECII. Failure mechanisms of various optical components are presented and molecular contamination levels in purge gas, tool enclosure, and clean room are documented. Finally the impacts of contaminant deposition and degradation of components on imaging performance is discussed.

引用

页码：724 / 733

页数：10