Electrochemical deposition of thin zirconia films on stainless steel 316 L

被引:59
作者
Stefanov, P
Stoychev, D
Valov, I
Kakanakova-Georgieva, A
Marinova, T [1 ]
机构
[1] Bulgarian Acad Sci, Inst Gen & Inorgan Chem, BU-1113 Sofia, Bulgaria
[2] Bulgarian Acad Sci, Inst Phys Chem, BU-1113 Sofia, Bulgaria
关键词
electrodeposition; stainless steel; zirconia;
D O I
10.1016/S0254-0584(00)00251-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Zirconia films (ZrO2) have been deposited electrochemically on stainless steel SS 316 L ina non-aqueous electrolyte based on absolute ethyl alcohol and ZrCl4. Scanning electron microscopy (SEM) studies have shown that the film consists of crystallites with a spheroidal shape, forming agglomerates with a very large surface area. Their sizes vary within the range of 0.1-0.5 mu m. The layer composition is very close to the stoichiometric ZrO2, as has been determined by X-ray photoelectron spectroscopy (XPS. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:222 / 225
页数:4
相关论文
共 14 条
[1]  
ATIC M, 1995, J MATER SCI LETT, V14, P178
[2]  
Atic M, 1997, J SOL-GEL SCI TECHN, V8, P517
[3]   The use of O1s charge referencing for the X-ray photoelectron spectroscopy of Al/Si, Al/Ti and Al/Zr mixed oxides [J].
Bhattacharya, AK ;
Pyke, DR ;
Reynolds, R ;
Walker, GS ;
Werrett, CR .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1997, 16 (01) :1-3
[4]   AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE SURFACE OXIDATION OF ZIRCONIUM [J].
DEGONZALEZ, CO ;
GARCIA, EA .
SURFACE SCIENCE, 1988, 193 (03) :305-320
[5]  
DETTNER H, 1963, HDB GALVANOTECHNIK, P338
[6]  
GRINBERG AM, 1987, GALVANOTECHNIKA, P87
[7]   ELECTRONIC-STRUCTURE AT ZIRCONIA NICKEL AND ZIRCONIA NICKEL-OXIDE INTERFACES [J].
HAREL, S ;
MARIOT, JM ;
HAGUE, CF .
SURFACE SCIENCE, 1992, 269 (1 -3 pt B) :1167-1172
[8]   XPS STUDY OF THE ROOM-TEMPERATURE SURFACE OXIDATION OF ZIRCONIUM AND ITS BINARY-ALLOYS WITH TIN, CHROMIUM AND IRON [J].
KUMAR, L ;
SARMA, DD ;
KRUMMACHER, S .
APPLIED SURFACE SCIENCE, 1988, 32 (03) :309-319
[9]   Synthesis of ceramic films on metallic substrates using magnetron-sputtering deposition synchro-enhanced by microwave ECR plasma source ion implantation under high vacuum conditions [J].
Ma, TC ;
Deng, XL ;
Lu, WQ ;
Zhang, JL .
PURE AND APPLIED CHEMISTRY, 1998, 70 (06) :1199-1202
[10]   THE EPITAXIAL-GROWTH OF ZIRCONIUM-OXIDE THIN-FILMS ON PT(111) SINGLE-CRYSTAL SURFACES [J].
MAURICE, V ;
SALMERON, M ;
SOMORJAI, GA .
SURFACE SCIENCE, 1990, 237 (1-3) :116-126