Kapitza conductance and phonon scattering at grain boundaries by simulation

被引:222
作者
Schelling, PK
Phillpot, SR
Keblinski, P
机构
[1] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA
[2] Forschungszentrum Karlsruhe, Inst Nanotechnol, D-76021 Karlsruhe, Germany
[3] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[4] Univ Cent Florida, Adv Mat Proc & Anal Ctr, Orlando, FL 32816 USA
[5] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[6] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
关键词
D O I
10.1063/1.1702100
中图分类号
O59 [应用物理学];
学科分类号
摘要
We use a nonequilibrium molecular-dynamics method to compute the Kapitza resistance of three twist grain boundaries in silicon, which we find to increase significantly with increasing grain boundary energy, i.e., with increasing structural disorder at the grain boundary. The origin of this Kapitza resistance is analyzed directly by studying the scattering of packets of lattice vibrations of well-defined polarization and frequency from the grain boundaries. We find that scattering depends strongly on the wavelength of the incident wave packet. In the case of a high-energy grain boundary, the scattering approaches the prediction of the diffuse mismatch theory at high frequencies, i.e., as the wavelength becomes comparable to the lattice parameter of the bulk crystal. We discuss the implications of our results in terms of developing a general model of scattering probabilities that can be applied to mesoscale models of heat transport in polycrystalline systems. (C) 2004 American Institute of Physics.
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页码:6082 / 6091
页数:10
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