Design of plasmonic back structures for efficiency enhancement of thin-film amorphous Si solar cells

被引：75

作者：

Bai, Wenli ^{[1
,2
,3
]}

Gan, Qiaoqiang ^{[3
]}

Bartoli, Filbert ^{[3
]}

Zhang, Jing ^{[1
,2
]}

Cai, Likang ^{[1
,2
]}

Huang, Yidong ^{[4
]}

Song, Guofeng ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Semicond, Nanooptoelect Lab, Beijing 100083, Peoples R China

[2] Chinese Acad Sci, Grad Univ, Beijing 100190, Peoples R China

[3] Lehigh Univ, Dept Elect & Comp Engn, Bethlehem, PA 18015 USA

[4] Tsinghua Univ, Dept Elect Engn, State Key Lab Integrated Optoelect, Beijing 100084, Peoples R China

来源：

OPTICS LETTERS | 2009年 / 34卷 / 23期

基金：

美国国家科学基金会; 中国国家自然科学基金;

关键词：

Thin films - Silicon solar cells - Plasmonics - Surface plasmons - Amorphous silicon - Electromagnetic wave polarization - Interfaces (materials) - Efficiency - Thin film solar cells;

D O I：

10.1364/OL.34.003725

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Metallic back structures with one-dimensional periodic nanoridges attached to a thin-film amorphous Si (a-Si) solar cell are numerically studied. At the interfaces between a-Si and metal materials, the excitation of surface-plasmon polaritons leads to obvious absorption enhancements in a wide near-IR range for different ridge shapes and periods. The highest enhancement factor of the cell external quantum efficiency is estimated to be 3.32. The optimized structure can achieve an increase of 17.12% in the cell efficiency. (C) 2009 Optical Society of America

引用

页码：3725 / 3727

页数：3

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