Controlling coverage of solution cast materials with unfavourable surface interactions

被引：28

作者：

Burlakov, V. M. ^{[1
]}

Eperon, G. E. ^{[2
]}

Snaith, H. J. ^{[2
]}

Chapman, S. J. ^{[1
]}

Goriely, A. ^{[1
]}

机构：

[1] Univ Oxford, Math Inst, Oxford OX2 6GG, England

[2] Univ Oxford, Dept Phys, Clarendon Lab, Oxford OX1 3PU, England

来源：

APPLIED PHYSICS LETTERS | 2014年 / 104卷 / 09期

基金：

英国工程与自然科学研究理事会; 欧洲研究理事会;

关键词：

SOLAR-CELLS; THIN; FILMS;

D O I：

10.1063/1.4867263

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Creating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconductor thin films as an example, we calculate surface coverage for a wide range of annealing temperatures and film thicknesses. The model generally predicts that for each value of the annealing temperature there is a range of film thicknesses leading to poor surface coverage. The model accurately reproduces solution-cast thin film coverage for organometal halide perovskites, key modern photovoltaic materials, and identifies processing windows for both high and low levels of surface coverage. (C) 2014 AIP Publishing LLC.

引用

页数：5

共 17 条

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