Dissolution and self-assembly: The solvophobic/hydrophobic effect

被引：49

作者：

Marmur, A ^{[1
]}

机构：

[1] Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2000年 / 122卷 / 09期

关键词：

D O I：

10.1021/ja9929281

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

[No abstract available]

引用

页码：2120 / 2121

页数：2

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