Branching ratios for methyl elimination in the reactions of OD radicals and Cl atoms with CH3SCH3

被引:27
作者
Zhao, Z
Stickel, RE
Wine, PH
机构
[1] GEORGIA INST TECHNOL,GEORGIA TECH RES INST,EOEML,PACB,ATLANTA,GA 30332
[2] GEORGIA INST TECHNOL,SCH CHEM & BIOCHEM,ATLANTA,GA 30332
基金
美国国家科学基金会;
关键词
D O I
10.1016/0009-2614(96)00059-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Laser flash photolysis of D2O2/RCH(3)/N-2 and Cl2CO/RCH(3)/N-2 mixtures (R = CH3S or H) was coupled with CH3 detection by time-resolved tunable-diode laser absorption spectroscopy to investigate the importance of C-S bond cleavage as an O-2-independent reaction pathway for the atmospherically interesting reactions of OD radicals and Cl atoms with CH3SCH3 at 298 K. Upper limit CH3 yields derived from the data (95% confidence level) are 0.07 for OD + CH3SCH3 and 0.02 for Cl + CH3SCH3.
引用
收藏
页码:59 / 66
页数:8
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