共 20 条
[4]
Single electron memory devices based on plasma-derived silicon nanocrystals
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS,
2000, 39 (8B)
:L855-L857
[9]
Film characteristics of low-temperature plasma-enhanced chemical vapor deposition silicon dioxide using tetraisocyanatesilane and oxygen
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1998, 37 (12A)
:6562-6568
[10]
Fabrication of nanocrystalline silicon with small spread of particle size by pulsed gas plasma
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS,
1997, 36 (6B)
:4031-4034