Changes in surface stress caused by the adsorption of an epitaxial metal monolayer

被引：20

作者：

Leiva, EPM ^{[1
]}

Del Pópolo, MG

Schmickler, W

机构：

[1] Univ Nacl Cordoba, Fac Ciencias Quim, Unidad Matemat & Fis, RA-5000 Cordoba, Argentina

[2] Univ Ulm, Abt Elektrochem, D-89069 Ulm, Germany

来源：

CHEMICAL PHYSICS LETTERS | 2000年 / 320卷 / 5-6期

关键词：

D O I：

10.1016/S0009-2614(00)00240-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The adsorption of a metal monolayer on a foreign substrate generates a change in the surface stress. We calculate this change for a number of substrate/adsorbate systems using the embedded-atom method. The results are compared with those obtained from a continuum model. A cycle, in which the stretching of a substrate/adsorbate system is decomposed into several steps, helps in understanding the numerical results. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：393 / 397

页数：5

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