Vacuum packaging technology using localized aluminum/silicon-to-glass bonding

被引:94
作者
Cheng, YT [1 ]
Hsu, WT
Najafi, K
Nguyen, CTC
Lin, LW
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ctr Wireless Integrated Microsyst, Ann Arbor, MI 48109 USA
[2] Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
基金
美国国家科学基金会;
关键词
localized heating; MEMS packaging; microresonators; vacuum encapsulation; wafer level packaging;
D O I
10.1109/JMEMS.2002.802903
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A glass vacuum package based on localized aluminum/silicon-to-glass bonding has been successfully demonstrated. A constant heat flux model shows that heating can be confined locally in the dielectric layer underneath a microheater as long as the width of the microheater and the thickness of silicon substrate are much smaller than the die size and a good heat sink is placed underneath the silicon substrate. With 3.4 W heating power, similar to0.2 MPa applied contact pressure and 90 min wait time before bonding, vacuum encapsulation at 25 mtorr (similar to3.33 Pa) can be achieved. Folded-beam comb drive mu-resonators are encapsulated and used as pressure monitors. Long-term testing of vacuum-packaged mu-resonators with a Quality Factor (Q) of 2500 has demonstrated stable operation after 69 weeks. A p-resonator with a Q factor of similar to9600 has been vacuum encapsulated and shown to be stable after 56 weeks.
引用
收藏
页码:556 / 565
页数:10
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