PIXE monitoring of diffusion during photo-polymerization

被引：8

作者：

Leewis, CM

Simons, DPL

de Jong, AM

Broer, DJ

de Voigt, MJA

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, Cyclotron Lab, NL-5600 MB Eindhoven, Netherlands

[2] Eindhoven Univ Technol, Eindhoven Polymer Labs, NL-5600 MB Eindhoven, Netherlands

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2000年 / 161卷

关键词：

scanning ion microprobe; PIXE; photo-polymerization; monomer diffusion; optical gratings; PIGE;

D O I：

10.1016/S0168-583X(99)00682-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：651 / 655

页数：5

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