Exchange coupling mechanisms at ferromagnetic/CoO interfaces

被引：33

作者：

Parker, FT

Takano, K ^{[1
]}

Berkowitz, AE

机构：

[1] Univ Calif San Diego, Ctr Magnet Recording Res, La Jolla, CA 92093 USA

[2] Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA

来源：

PHYSICAL REVIEW B | 2000年 / 61卷 / 02期

关键词：

D O I：

10.1103/PhysRevB.61.R866

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The nature of the interfacial exchange between a ferromagnetic (FM) metal film and an antiferromagnetic oxide film was investigated in FM (30 nm)/CoO(30 nm) bilayer films, with the FM materials Fe, Co, Ni, Ni80Fe20, and Ni50Co50. FM materials with a high Ni concentration exhibit reduced values of net unidirectional interfacial exchange energy density, Delta sigma. Mean-field analysis predicts the variation in Delta sigma and indicates that the interfacial coupling occurs via direct exchange between metal atoms. An alternative, possibly coexisting mechanism involves plausible interfacial chemical reactions.

引用

页码：R866 / R869

页数：4

共 22 条

[1]

ALBANESE G, 1992, LANDOLTBORNSTEIN G, V27

[2]

Bozorth RM., 1951, FERROMAGNETISM

[3] EXCHANGE-ANISOTROPY IN COUPLED FILMS OF NI81FE19 WITH NIO AND COXNI1-XO [J].