Large scale fluorine doped textured transparent conducting SnO2 films deposited by atmospheric pressure chemical vapour deposition

Large scale (30 x 30 cm(2)) transparent conducting F-doped textured SnO2 films were prepared by atmosphere pressure chemical vapour deposition. Uniformly polycrystalline SnO2:F films having a variable preferred orientation were obtained with resistivity as low as 5 x 10(-4) Omega cm(-1), with carrier concentrations between 3.5 x 10(20) and 7 x 10(20) cm(-3) and Hall mobilities from 15.7 to 20.1 cm(2) V-1 s(-1). The average transmittance (including diffuse transmittance) is higher than 90% in the wavelength range of the visible spectrum and the maximum infrared reflectance reaches 92% for a film 655 nm thick. Substrate temperature and fluorine flow rate are the main parameters affecting sheet resistance and transmittance of the resulting films. Oxygen flow rate also influences the film quality to some extent. (C) 1997 Elsevier Science S.A.