Silica orthorhombic mesostructured films with low refractive index and high thermal stability

被引:112
作者
Falcaro, P
Grosso, D
Amenitsch, H
Innocenzi, P
机构
[1] Univ Padua, Dipartimento Ingn Meccan, I-35131 Padua, Italy
[2] Univ Paris 06, Lab Chim Mat Condense, F-75252 Paris 05, France
[3] Austrian Acad Sci, Inst Biophys, A-8042 Graz, Austria
[4] Austrian Acad Sci, Xray Struct Res, A-8042 Graz, Austria
[5] Univ Sassari, Dipartimento Architettura & Pianificazione, Lab Sci Mat & Nanotecnol, I-07041 Alghero, Sassari, Italy
关键词
D O I
10.1021/jp037740p
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Silica mesoporous films have been synthesized via Evaporation Induced Self-Assembling (EISA) using Pluronic F-127 as a templating agent and mesostructures with Fmmm orthorhombic symmetry have been obtained. An optimized thermal process to stabilize the silica walls has been used; the silica films exhibited an excellent thermal stability in a large range of temperatures and the mesostructure remained organized up to 950 degreesC. Fourier transform infrared spectroscopy has shown that the high thermal stability is correlated with a progressive strengthening of the silica structure during thermally-induced polycondensation reactions and structural rearrangements of 4-fold rings present in the silica walls. The mesostructure after annealing at 850 degreesC is free of silanols and still maintains a high degree of order. The refractive index, volume porosity, and shrinkage have been studied as a function of the thermal treatment up to 1050 degreesC. The films have a low refractive index (1.32), upon removal of the organic template via thermal calcination, and show a 30% residual porosity up to 850 degreesC.
引用
收藏
页码:10942 / 10948
页数:7
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