Local structure determination of NH2 on Si(111)-(7X7) -: art. no. 125340

被引：12

作者：

Bengió, S ^{[1
]}

Ascolani, H

Franco, N

Avila, J

Asensio, MC

Bradshaw, AM

Woodruff, DP

机构：

[1] Comis Nacl Energia Atom, CONICET, RA-8400 San Carlos De Bariloche, Rio Negro, Argentina

[2] Comis Nacl Energia Atom, Ctr Atom Bariloche, RA-8400 San Carlos De Bariloche, Rio Negro, Argentina

[3] CSIC, Inst Ciencia Mat, E-28049 Madrid, Spain

[4] Univ Paris 11, LURE, F-91405 Orsay, France

[5] Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany

[6] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England

来源：

PHYSICAL REVIEW B | 2004年 / 69卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.69.125340

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

N 1s scanned-energy mode photoelectron diffraction has been used to determine the local adsorption geometry of adsorbed NH2 species on Si(111) (7 X 7) resulting from reaction with NH3 at room temperature. The results show that NH2 is adsorbed (almost) exclusively atop Si surface rest atoms with a Si-N bond length of 1.71 +/- 0.02 Angstrom and very little modification of the geometry of the Si atoms in the layer below. Any coadsorbed NH on the surface is either of low relative coverage or is also adsorbed in local atop sites. There is evidence that a small fraction (8 +/- 7 %) of the NHx species may occupy sites atop Si surface adatoms.

引用

页数：9

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