A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering

被引：24

作者：

Mahieu, S

De Winter, G

Depla, D

De Gryse, R

Denul, J

机构：

[1] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium

[2] Bekaert, B-8550 Zwevegem, Belgium

来源：

SURFACE & COATINGS TECHNOLOGY | 2004年 / 187卷 / 01期

关键词：

growth models; grain growth; reactive sputtering; direct current; magnetron; oxides;

D O I：

10.1016/j.surfcoat.2004.01.008

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Biaxially aligned YSZ layers were deposited by reactive DC sputtering with an unbalanced magnetron. These biaxially aligned YSZ layers have an [001] out-of-plane orientation and an [110] in-plane orientation. A model for the growth of this specific out-of-plane and inplane orientation is proposed. The proposed model is based on two anisotropic mechanisms: anisotropic surface mobility of the metallic adatoms and anisotropy in lateral growth rate of the different [001] out-of-plane oriented grains. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：122 / 130

页数：9

共 36 条

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