Perpendicular magnetization in ultrathin electrodeposited cobalt films

被引:46
作者
Bubendorff, JL
Beaurepaire, E
Meny, C
Panissod, P
Bucher, JP
机构
[1] Institut de Physique et de Chimie des Matériaux de Strasbourg (IPCMS), Université Louis Pasteur, rue du Loess
关键词
D O I
10.1103/PhysRevB.56.R7120
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrodeposited ultrathin cobalt films on Au(lll) covered with a protective copper film can show perpendicular magnetization exactly like their ultrahigh-vacuum-grown counterparts. At high deposition rates of cobalt, out-of-plane magnetization is stabilized in the thickness range from 2 to 8 atomic layers while low deposition rates favor in-plane magnetization at any thickness. The cobalt films possess hcp structure with the c axis perpendicular to the Au(111) plane. The technique is versatile and leads to quality standards comparable to those obtained by molecular-beam epitaxy, but at a much lower cost.
引用
收藏
页码:R7120 / R7123
页数:4
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