Growth of long-period gratings in H2-loaded fiber after 193-nm UV inscription

被引：37

作者：

Guan, BO ^{[1
]}

Tam, HY

Ho, SL

Liu, SY

Dong, XY

机构：

[1] Hong Kong Polytech Univ, Dept Elect Engn, Kowloon, Hong Kong, Peoples R China

[2] Nankai Univ, Inst Modern Opt, Tianjin 300071, Peoples R China

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2000年 / 12卷 / 06期

基金：

欧盟地平线“2020”;

关键词：

fabrication; long-period gratings; photosensitivity; thermal stability;

D O I：

10.1109/68.849070

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This letter reports and provides an explanation for the growth behavior of long-period gratings in H-2-loaded fiber immediately after 193-nm UV inscription. Growth of grating resonance peak by as much as 14 dB was measured. Impact of temperature and grating strength, immediately after UV inscription, on the growth behavior are also discussed.

引用

页码：642 / 644

页数：3

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