Nickel and copper electroplating of proton beam micromachined SU-8 resist

被引:6
作者
van Kan, JA [1 ]
Rajta, I [1 ]
Ansari, K [1 ]
Bettiol, AA [1 ]
Watt, F [1 ]
机构
[1] Natl Univ Singapore, Res Ctr Nucl Microscopy, Dept Phys, Singapore 119260, Singapore
来源
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2002年 / 8卷 / 06期
关键词
D O I
10.1007/S00542-001-0139-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Proton beam micromachining (PBM) has been shown to be a powerful technique to produce three-dimensional (3D) high-aspect-ratio microstructures (Watt et al., 2000). Potential commercial applications of PBM, which is a fast direct write technique, will become feasible if the fabrication of metallic molds or stamps is realised. Metallic components can be produced by electroplating a master from a microstructure produced in resist. The production of high-aspect-ratio metallic stamps and molds requires a lithographic technique capable of producing smooth and near 90degrees sidewalls and a one to one conversion of a resist structure to a metallic microstructure. PBM is the only technique capable of producing high-aspect-ratio microstructures with sub-micron details via a direct write process. In PBM, SU-8 (Lorenz et al., 1997) resist structures are produced by exposing the SU-8 resist with a focused MeV proton beam followed by chemical development and a subsequent electroplating step using Ni or Cu. The data presented shows that PBM can successfully produce high-aspect-ratio, sub-micron sized smooth metallic structures with near 90degrees sidewall profiles.
引用
收藏
页码:383 / 386
页数:4
相关论文
共 11 条
[1]   A LabVIEW™-based scanning and control system for proton beam micromachining [J].
Bettiol, AA ;
van Kan, JA ;
Sum, TC ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2001, 181 :49-53
[2]  
Cerrina F., 1997, HDB MICROLITHOGRAPHY, V1, P251
[3]   SU-8: a low-cost negative resist for MEMS [J].
Lorenz, H ;
Despont, M ;
Fahrni, N ;
LaBianca, N ;
Renaud, P ;
Vettiger, P .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1997, 7 (03) :121-124
[4]  
LOWENHEIM FA, 1978, ELECTROPLATING, P188
[5]  
ROMANKIW LT, 1997, HDB MICROLITHOGRAPHY, V2, P239
[6]   A high resolution beam scanning system for deep ion beam lithography [J].
Sanchez, JL ;
van Kan, JA ;
Osipowicz, T ;
Springham, SV ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 136 :385-389
[7]   High precision 3D metallic microstructures produced using proton beam micromachining [J].
van Kan, JA ;
Bettiol, AA ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2001, 181 :258-262
[8]   Micromachining using focused high energy ion beams: Deep Ion Beam Lithography [J].
van Kan, JA ;
Sanchez, JL ;
Xu, B ;
Osipowicz, T ;
Watt, F .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 148 (1-4) :1085-1089
[9]   Proton micromachining: a new technique for the production of three-dimensional microstructures [J].
van Kan, JA ;
Sanchez, JL ;
Osipowicz, T ;
Watt, F .
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2000, 6 (03) :82-85
[10]   Nuclear microprobe analysis and imaging: Current state of the art performances [J].
Watt, F ;
Osipowicz, T ;
Choo, TF ;
Orlic, I ;
Tang, SM .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1998, 136 :313-317