Effects of surface porosity on tungsten trioxide(WO3) films' electrochromic performance

被引:54
作者
Lee, WJ
Fang, YK
Ho, JJ
Hsieh, WT
Ting, SF
Huang, DY
Ho, FC
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, VLSI Technol Lab, Tainan 70100, Taiwan
[2] Fortune Inst Technol, Dept Elect Engn, Kaohsiung 84200, Taiwan
[3] Int Tech Res Inst, Optelect & Syst Lab, Chutung 31015, Taiwan
关键词
tungsten trioxide; optical density change; coloration efficiency; electrochromic performance;
D O I
10.1007/s11664-000-0139-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the correlation between the electrochromic performance and the surface morphology of the tungsten trioxide (WO3) thin films sputtered by de reactive magnetron sputtering with widely varying target-substrate distances was investigated. It is found that the optical density change (Delta OD) of films is strongly affected by the target-substrate distance. The coloration efficiency (CE) at 633 nm was also found to be sensitive to the target-substrate distance, with 16 cm(2)/C of him sputtered at 6 cm and 50 cm(2)/C at 18 cm. X-ray diffraction showed that the crystal structure of films was amorphous. By using atomic force microscope to identify the surface porosity of the sputtered WO3 films, we found that the film at longer target-substrate distance was rough, porous, and having a cone-shaped columns morphology, thus offering a good electrochromic performance for opto-switching applications.
引用
收藏
页码:183 / 187
页数:5
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