Dynamics of plasma-surface interactions in chemically active plasmas

被引:4
作者
Cerny, Pavel [1 ]
Novak, Stanislav [1 ]
Hrach, Rudolf [1 ,2 ]
机构
[1] Univ JE Purkyne, Fac Sci, Dept Phys, Usti Nad Labem 40096, Czech Republic
[2] Charles Univ Prague, Fac Math & Phys, Dept Surface & Plasma Sci, CR-18000 Prague 8, Czech Republic
关键词
Plasma-surface interaction; Simulation methods; Particle-in-Cell method; ELECTRONEGATIVE PLASMAS; MODEL; OXYGEN; AR/O-2; O-2; AR;
D O I
10.1016/j.vacuum.2009.06.010
中图分类号
T [工业技术];
学科分类号
120111 [工业工程];
摘要
The contribution presents results of computer simulations describing the interaction between a low-temperature multicomponent plasma and an immersed metal substrate. For this purpose two models were prepared. The first model is designed to follow the volume processes in oxygen-containing electronegative plasma. The technique used was the macroscopic kinetic approach with a kinetic scheme consisting of more than 100 reactions. As a result, the concentrations of individual charged species for various discharge parameters were derived. These species are used as input parameters in the second model based on the Particle-in-Cell-Monte Carlo Collision (PIC-MCC) particle simulation technique. The sheath structure of the multicomponent plasma containing more than one type of negative as well as positive ions and the fluxes of individual charged species impinging the oxidized substrates were studied with the help of this model. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:97 / 100
页数:4
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