Correlation between magnetic properties of electrodeposited Co(P) and NH4Cl concentrations in the electrolyte

被引:15
作者
Lee, KH [1 ]
Kim, GH [1 ]
Jeung, WY [1 ]
机构
[1] Korea Inst Sci & Technol, Mat Res Div, Seoul 136791, South Korea
关键词
Co(P); electrodeposition; NH4Cl; microstructure; ferromagnetic;
D O I
10.1016/S1388-2481(02)00389-2
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The effect of ammonium chloride on the electrodeposition process and resulting magnetic properties of Co(P) alloy films was investigated. It was observed that the magnetic properties of the films varied extensively with the ammonium chloride contents in the solution. Cyclic voltammetry was employed as an electroanalytical technique to characterize the variation of interfacial polarization at different electrolyte compositions. In addition, microstructural characterization of electrodeposited Co(P) thin films by transmission electron microscopy revealed a significant increase in both grain size and preferred orientation of Co(P) grains with ammonium chloride contents. Results of characterizations indicated that the addition of ammonium chloride controlled the kinetics of electrocrystallization of Co(P) by modifying the charge transfer process and thus gave rise to increased grain size and preferred orientation in the Co(P) thin films. These microstructural features provide reasonable explanation on the variation of the magnetic properties of electrodeposited Co(P) films with the amount of ammonium chloride in the solution. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:605 / 609
页数:5
相关论文
共 14 条
[1]  
CASTELLANI EE, 1978, Patent No. 4102756
[2]   Effect of magnetostatic coupling between free and reference layers on the thermal stability of synthetic spin valves [J].
IEEE ;
不详 .
IEEE Transactions on Magnetics, 2000, 36 (5 I) :2863-2865
[3]   Conditions for the electrochemical synthesis of the CoPn3 (Pn = P, As, Sb) skutterudites [J].
DeMattei, RC ;
Watcharapasorn, A ;
Feigelson, RS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (09) :D109-D111
[4]  
DINI J, 1988, PLAT SURF FINISH, V75, P6
[5]   Electrodeposition of amorphous alloys based on the iron group of metals [J].
Djokic, SS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (05) :1824-1828
[6]   THE RESPONSE OF SOME NUCLEATION GROWTH-PROCESSES TO TRIANGULAR SCANS OF POTENTIAL [J].
FLETCHER, S ;
HALLIDAY, CS ;
GATES, D ;
WESTCOTT, M ;
LWIN, T ;
NELSON, G .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 159 (02) :267-285
[7]   ELECTRODEPOSITION OF ZINC NICKEL-ALLOY COATINGS FROM A CHLORIDE BATH CONTAINING NH4CL [J].
FRATESI, R ;
ROVENTI, G .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 1992, 22 (07) :657-662
[8]  
JI J, 1995, J APPL ELECTROCHEM, V25, P642
[9]   Micromachined thick permanent magnet arrays on silicon wafers [J].
Liakopoulos, TM ;
Zhang, WJ ;
Ahn, CH .
IEEE TRANSACTIONS ON MAGNETICS, 1996, 32 (05) :5154-5156
[10]  
MYUNG NV, 2000, 198 ECS M, P583