Novel integration technologies for highly manufacturable 32Mb FRAM

被引:22
作者
Kim, HH [1 ]
Song, YJ [1 ]
Lee, SY [1 ]
Joo, HJ [1 ]
Jang, NW [1 ]
Jung, DJ [1 ]
Park, YS [1 ]
Park, SO [1 ]
Lee, KM [1 ]
Joo, SH [1 ]
Lee, SW [1 ]
Nam, SD [1 ]
Kim, K [1 ]
机构
[1] Samsung Elect Co Ltd, TDI PJT, Yongin, Kyungki Do, South Korea
来源
2002 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS | 2002年
关键词
D O I
10.1109/VLSIT.2002.1015456
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:210 / 211
页数:2
相关论文
共 3 条
[1]  
KIM HH, 2001, IN PRESS ISIF
[2]  
Kinam Kim, 1999, Integrated Ferroelectrics, V25, P149, DOI 10.1080/10584589908210168
[3]  
Lee S. Y., 1999, 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325), P141, DOI 10.1109/VLSIT.1999.799383