Adsorption of ethene on Cu(111)

被引：30

作者：

Linke, R ^{[1
]}

Becker, C ^{[1
]}

Pelster, T ^{[1
]}

Tanemura, M ^{[1
]}

Wandelt, K ^{[1
]}

机构：

[1] NAGOYA INST TECHNOL,SHOWA KU,NAGOYA,AICHI 466,JAPAN

来源：

SURFACE SCIENCE | 1997年 / 377卷 / 1-3期

关键词：

copper; electron energy loss spectroscopy; ethene; low energy electron diffraction; thermal programmed desorption; work function;

D O I：

10.1016/S0039-6028(96)01475-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The adsorption of ethene on Cu(111) has been investigated using LEED, HREELS, TPD and work function measurements (Delta phi) at 100 K. Ethene adsorption results in a maximum Delta phi value of 0.90 eV. The TPD exhibits a single desorption state with a maximum desorption rate at 120 K. In the vibrational spectrum a dominant energy loss signal at 112 meV is assigned to the out of plane CH2 wagging mode. No additional diffraction pattern could be observed after ethene adsorption in the entire coverage range.

引用

页码：655 / 658

页数：4

共 16 条

[1] POSITION OF THE SIGMA-SHAPE AND PI-RESONANCES OF C2H2, C2H4 AND C2H6 ON CU(100) AT 60-K - A NEXAFS STUDY [J].