Processing applications with the 157-nm fluorine excimer laser

Excimer-laser processing techniques can be extended to a broader and more diverse range of materials by moving to vacuum-ultraviolet (100-200 nm) laser sources such as the molecular fluorine laser. The 157-nm output wavelength takes advantage of the high opacity in most materials and a short pulse duration to minimize thermal loading of target surfaces. The laser readily drives photochemical interactions and affords patterning of similar to 0.1-mu m features. In this paper, we summarize the recent progress in our laboratory on applying these principles to the development of F-2 laser applications. Examples include micromachining of high-bandgap optical materials, fabricating rib waveguides, growing debris-free silica films, driving photosensitivity responses in optical fibers, photochemical processing of III-V semiconductors, and writing fine-feature holographic structures.