Nonvolatile Unipolar and Bipolar Resistive Switching Characteristics in Co-doped TiO2 Thin Films with Different Compliance Currents

被引:14
作者
Do, Young Ho [1 ]
Kwak, June Sik [1 ]
Hong, Jin Pyo [1 ]
Im, Hyunsik [2 ]
Park, Bae Ho [3 ]
机构
[1] Hanyang Univ, Dept Phys, Novel Funct Mat & Devices Lab, Seoul 133791, South Korea
[2] Dongguk Univ, Dept Semicond Sci, Seoul 100715, South Korea
[3] Konkuk Univ, Dept Phys, Seoul 143091, South Korea
关键词
ReRAM; Nonvolatile memory; Bipolar switching; Co-doped TiO2; RESISTANCE;
D O I
10.3938/jkps.55.1009
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The resistive switching behavior of 100nmthick Co-doped TiO2 thin films grown by using a conventional rf magnetron sputtering system was investigated by using structural and electrical measurements The Co-doped TiO2 thin films dispaly a rutile phase and a column-like structure. An unusual result, a switching transition from a unipolar to a bipolar behavior, was clearly observed at a high compliance current. The experimental results suggest that the switching transition is related to the formation of trap sites (CoOx, TiO2-x, and Co-x-Ti1-xO2) under large electrical stress conditions. The improved reproducible switching properties of our Co-doped TiO2 materials under forward and reverse bias stresses demonstrate the possibility of future non-volatile memory elements.
引用
收藏
页码:1009 / 1012
页数:4
相关论文
共 12 条
[1]  
BAEK C, 2004, INT EL DEV M, P584
[2]   Field-driven hysteretic and reversible resistive switch at the Ag-Pr0.7Ca0.3MnO3 interface [J].
Baikalov, A ;
Wang, YQ ;
Shen, B ;
Lorenz, B ;
Tsui, S ;
Sun, YY ;
Xue, YY ;
Chu, CW .
APPLIED PHYSICS LETTERS, 2003, 83 (05) :957-959
[3]  
Chen A, 2005, INT EL DEVICES MEET, P765
[4]  
Do YH, 2006, J KOREAN PHYS SOC, V48, P1492
[5]  
Hayashi T, 2002, INTERNATIONAL ELECTRON DEVICES 2002 MEETING, TECHNICAL DIGEST, P543, DOI 10.1109/IEDM.2002.1175899
[6]   Effect of O2 Post Annealing and Plasma Treatment in Enhancing the Resistance Switching Characteristics of Pr0.7Ca0.3MnO3 Films with SrRuO3 Buffer Layers [J].
Joo, Sanghyun ;
Sok, Junghyun .
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 53 (06) :3427-3430
[7]  
Lai S., 2001, IEDM, P803
[8]   Ti-O Binding States of Resistive Switching TiO2 Thin Films Prepared by Reactive Magnetron Sputtering [J].
Lee, Kwang Bae ;
Lee, Kyung Haeng ;
Cha, Jeong Ok ;
Ahn, Jeung Sun .
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 53 (04) :1996-2001
[9]   Device physics - Magnetoelectronics [J].
Prinz, GA .
SCIENCE, 1998, 282 (5394) :1660-1663
[10]   Electronic Structure of the NiOx Film Fabricated by Using a Thermal Oxidation Technique [J].
Seo, Y. K. ;
Lee, D. J. ;
Lee, Y. S. ;
Choi, W. S. ;
Kim, D. -W. .
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 55 (01) :129-133