Dynamics of graphene growth on a metal surface: a time-dependent photoemission study

被引：163

作者：

Grueneis, Alexander ^{[1
,2
]}

Kummer, Kurt ^{[3
]}

Vyalikh, Denis V. ^{[3
]}

机构：

[1] Univ Vienna, Fac Phys, A-1090 Vienna, Austria

[2] IFW Dresden, D-01171 Dresden, Germany

[3] Tech Univ Dresden, Inst Solid State Phys, D-01062 Dresden, Germany

来源：

NEW JOURNAL OF PHYSICS | 2009年 / 11卷

关键词：

GRAPHITE; CARBON; NICKEL;

D O I：

10.1088/1367-2630/11/7/073050

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Applying time-dependent photoemission we unravel the graphene growth process on a metallic surface by chemical vapor deposition (CVD). Graphene CVD growth is in stark contrast to the standard growth process of two-dimensional films because it is self-limiting and stops as soon as a monolayer of graphene has been synthesized. Most importantly, a novel phase of metastable graphene was discovered that is characterized by permanent and simultaneous construction and deconstruction. The high quality and large area graphene flakes are characterized by angle-resolved photoemission, proving that they are indeed monolayer and cover the whole 1 x 1 cm Ni(111) substrate. These findings are of high relevance to the intensive search for reliable synthesis methods for large graphene flakes of controlled layer number.

引用

页数：9

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