High-tensile ductility in nanocrystalline copper

被引:122
作者
Lu, L [1 ]
Wang, LB [1 ]
Ding, BZ [1 ]
Lu, K [1 ]
机构
[1] Chinese Acad Sci, Inst Met Res, State Key Lab RSA, Shenyang 110015, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1557/JMR.2000.0043
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work we report a high-tensile ductility in a fully dense bulk nanocrystalline (nc) pure copper sample prepared by electrodeposition. A tensile ductility with an elongation to fracture of 30% was obtained in the ne Cu specimen with an average grain size of 27 nm, which is comparable to that for the coarse-grained polycrystalline Cu. An enhanced yield stress (119 MPa) and a depressed strain hardening exponent (0.22) were observed in the nc Cu sample with respect to the conventional polycrystalline Cu. The high-tensile ductility was attributed to the minimized artifacts in the nc sample, and the grain-boundary sliding deformation mechanism resulted from the numerous amount small-angle grain boundaries and the low microstrain (dislocation density).
引用
收藏
页码:270 / 273
页数:4
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