In situ growth study of NiMnSb films on MgO(001) and Si(001)

被引：17

作者：

Schlomka, JP ^{[1
]}

Tolan, M ^{[1
]}

Press, W ^{[1
]}

机构：

[1] Univ Kiel, Inst Expt & Angew Phys, D-24098 Kiel, Germany

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 15期

关键词：

D O I：

10.1063/1.126236

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The sputter deposition of thin magnetic NiMnSb films on MgO(001) and Si(001) is investigated by in situ x-ray scattering. It is shown that the roughness of the layers as a function of the film thickness increases according to power laws with unusually large growth exponents. The optimum growth conditions are found on the substrate MgO(001) at temperatures of 250 degrees C during the deposition. (C) 2000 American Institute of Physics. [S0003-6951(00)00415-0].

引用

页码：2005 / 2007

页数：3

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