Theory of optical imaging beyond the diffraction limit with a far-field superlens

被引:7
作者
Durant, Stephane [1 ]
Liu, Zhaowei [1 ]
Fang, Nicholas [2 ]
Zhang, Xiang [1 ]
机构
[1] Univ Calif Berkeley, NSF, NSEC, Etcheverry Hall, Berkeley, CA 94720 USA
[2] Univ Illinois, Dept Mech & Ind Engn, Urbana, IL 61801 USA
来源
PLASMONICS: METALLIC NANOSTRUCTURES AND THEIR OPTICAL PROPERTIES IV | 2006年 / 6323卷
关键词
D O I
10.1117/12.680804
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Recent theoretical and experimental studies have shown that imaging with resolution well beyond the diffraction limit can be obtained with so-called superlenses. Images formed by such superlenses are, however, in the near field only, or a fraction of wavelength away from the lens. In this paper, we propose a far-field superlens (FSL) device which is composed of a planar superlens with periodical corrugation. We show in theory that when an object is placed in close proximity of such a FSL, a unique image can be formed in far-field. As an example, we demonstrate numerically that images of 40 nm lines with a 30 run gap can be obtained from far-field data with properly designed FSL working at 376nm wavelength.
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页数:8
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