Structural characterization of BiFeO3 thin films by reciprocal space mapping

被引:78
作者
Saito, Keisuke
Ulyanenkov, Alexander
Grossmann, Volkmar
Ress, Heiko
Bruegemann, Lutz
Ohta, Hideo
Kurosawa, Toshiyuki
Ueki, Sadao
Funakubo, Hiroshi
机构
[1] Bruker AXS, Applicat Lab, Kanagawa Ku, Yokohama, Kanagawa 2210022, Japan
[2] Bruker AXS, D-76187 Karlsruhe, Germany
[3] Tokyo Inst Technol, Interdisciplinary Grad Sch, Dept Innovat & Engineered Mat, Midori Ku, Yokohama, Kanagawa, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 9B期
关键词
BiFeO3; X-ray diffraction (XRD); reciprocal space mapping; MOCVD;
D O I
10.1143/JJAP.45.7311
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-resolution X-ray diffraction reciprocal space mapping (HRXRD-RSM) was applied for the structural characterization of epitaxial BiFeO3 thin film grown on SrRuO3-coated (001) SrTiO3 single crystal substrate with a variety of film thicknesses ranging from 15 to 500 nm. Distinguishing monoclinic structure from rhombohedral or tetragonal structures was accomplished with a set of HRXRD-RSMs measured for several hkl diffraction conditions. The BiFeO3 thin films showed both monoclinic and tetragonal structures depending on film thickness. Tetragonal structure was observed for film thicknesses below 50 nm and was highly strained due to epitaxial strain, while films with film thickness thicker than 50 nm showed monoclinic structure. No BiFeO3 thin films showed bulk rhombohedral structure. This structural change in BiFeO3 thin film may play an important role in the enhanced ferroelectricity observed.
引用
收藏
页码:7311 / 7314
页数:4
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