Abatement of industrial sulfonic pollutants by ozone and UV radiation

被引：6

作者：

Amat, AM

Arques, A

López, F

Seguí, S

Miranda, MA

机构：

[1] Univ Politecn Valencia, EPSA, Dept Ingn Textil & Papelera, E-03801 Alicante, Spain

[2] Univ Politecn Valencia, EPSA, Dept Ingn Quim & Nucl, E-03801 Alicante, Spain

[3] Univ Politecn Valencia, CSIC, Dept Quim, E-46071 Valencia, Spain

[4] Univ Politecn Valencia, CSIC, Inst Tecnol Quim, E-46071 Valencia, Spain

来源：

ENVIRONMENTAL ENGINEERING SCIENCE | 2004年 / 21卷 / 04期

关键词：

environment; photochemistry; pollution; surfactant; ozone; p-toluenesulfonic acid;

D O I：

10.1089/1092875041358520

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

p-Toluenesulfonic acid has been used as a model compound for the degradative oxidation of sulfonic compounds found in industrial wastewaters. The effect of ozone and UV has been studied in both acidic and basic media. Experiments in the presence of t-butanol support the involvement of hydroxyl radicals. Two experimental setups have been employed for ozone oxidation of the pollutant; the experimental data fit theoretical expectations in both cases. Finally, the studies have been extended to the degradation of a commercial surfactant having a sulfonic acid structure, namely dodecylbenzenesulfonate.

引用

页码：485 / 492

页数：8

共 21 条

[1] p-Coumaric acid photodegradation with solar light, using 2,4,6-triphenylpyrylium salt as photosensitizer -: A comparison with other oxidation methods [J].