Thermal conductivity of β-Si3N4:: I, effects of various microstructural factors

被引:154
作者
Kitayama, M [1 ]
Hirao, K
Toriyama, M
Kanzaki, S
机构
[1] Fine Ceram Res Assoc, Synergy Ceram Lab, Nagoya, Aichi 4638687, Japan
[2] Natl Ind Res Inst Nagoya, Nagoya, Aichi 4638687, Japan
关键词
D O I
10.1111/j.1151-2916.1999.tb02209.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Calculations based on a simple modified Wiener's model for thermal conductivity of a composite material predict that the thermal conductivity of beta-Si3N4 decreases quickly as the grain-boundary film thickness increases within a range of a few tenths of a nanometer and also that it initially increases steeply with increased grain size, then reaches almost constant values. Because of the faceted nature of the beta-Si3N4 crystal, the "average" grain-boundary film thickness is much greater than that in equilibrium. The present study demonstrates both theoretically and experimentally that grain growth alone cannot improve the thermal conductivity of beta-Si3N4.
引用
收藏
页码:3105 / 3112
页数:8
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