Epitaxial growth in dislocation-free strained alloy films: Morphological and compositional instabilities

被引:32
作者
Huang, ZF [1 ]
Desai, RC [1 ]
机构
[1] Univ Toronto, Dept Phys, Toronto, ON M5S 1A7, Canada
关键词
D O I
10.1103/PhysRevB.65.205419
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The mechanisms of stability or instability in the strained alloy film growth are of intense current interest to both theorists and experimentalists. We consider dislocation-free, coherent, growing alloy films which could exhibit a morphological instability without nucleation. We investigate such strained films by developing a nonequilibrium continuum model and by performing a linear stability analysis. The couplings of film-substrate misfit strain, compositional stress, deposition rate, and growth temperature determine the stability of film morphology as well as the surface spinodal decomposition. We consider some realistic factors of epitaxial growth, in particular the composition dependence of elastic moduli and the coupling between the top surface and underlying bulk of the film. The interplay of these factors leads to new stability results. In addition to the stability diagrams both above and below the coherent spinodal temperature, we also calculate the kinetic critical thickness for the onset of instability as well as its scaling behavior with respect to misfit strain and deposition rate. We apply our results to some real growth systems and discuss the implications related to some recent experimental observations.
引用
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页码:1 / 20
页数:20
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