A quantitative analysis of single pulse ultraviolet dry laser cleaning

被引:59
作者
Halfpenny, DR [1 ]
Kane, DM [1 ]
机构
[1] Macquarie Univ, Sch Math Phys Comp & Elect, N Ryde, NSW 2109, Australia
关键词
D O I
10.1063/1.371737
中图分类号
O59 [应用物理学];
学科分类号
摘要
Particles as small as 0.3 mu m in diameter have been successfully removed from a glass surface using a single ultraviolet pulse from a frequency doubled copper vapor laser (255.3 nm). Quantitative analysis of the particle density before and after laser irradiation shows that laser cleaning occurs after a fluence threshold is reached. The cleaning efficiency after threshold follows a nonlinear trend with respect to fluence. A model is presented which reveals that the cleaning efficiency is a function of the irradiance distribution of the beam used. Results of modeling thermal expansion of the substrate and particles, and particle adhesion do not confirm a thermal expansion mechanism for laser cleaning in this study, in contrast with other recent reports. (C) 1999 American Institute of Physics. [S0021-8979(99)06223-4].
引用
收藏
页码:6641 / 6646
页数:6
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