Spatially selective electroless deposition of cobalt on oxide surfaces directed by microcontact printing of dendrimers

被引:43
作者
Wu, XC [1 ]
Bittner, AM [1 ]
Kern, K [1 ]
机构
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
关键词
D O I
10.1021/la0200764
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We describe a simple method for the fabrication of arbitrary submicrometer patterns of cobalt on a nonconducting surface with wet chemical methods and microcontact printing (muCP). A hydroxyl-terminated dendrimer is transferred from a stamp to the surface. The thickness of the dendrimer layer can be tuned by varying the concentration of the dendrimer ink solution. These dendrimer molecules act as host molecules. The guests, palladium ions, sorb into the layer and act as nucleation centers for electroless cobalt plating. We produced cobalt structures down to several hundred nanometers lateral size and up to several tens of nanometer thickness with high spatial selectivity. The printed dendrimers are cage-like molecules with well-defined chemical groups; hence, they can selectively bind guest molecules (here palladium complexes) when the latter possess chemical groups that favor a host-guest interaction. Printing dendrimers therefore points toward a more general method to create patterns with chemical functionality.
引用
收藏
页码:4984 / 4988
页数:5
相关论文
共 37 条
[1]  
Bernard A, 2000, ADV MATER, V12, P1067, DOI 10.1002/1521-4095(200007)12:14<1067::AID-ADMA1067>3.0.CO
[2]  
2-M
[3]  
BITTNER AM, IN PRESS ADV FUNCT M
[4]   Self-assembled inverted micelles prepared from a dendrimer template: Phase transfer of encapsulated guests [J].
Chechik, V ;
Zhao, MQ ;
Crooks, RM .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1999, 121 (20) :4910-4911
[5]   Transport mechanisms of alkanethiols during microcontact printing on gold [J].
Delamarche, E ;
Schmid, H ;
Bietsch, A ;
Larsen, NB ;
Rothuizen, H ;
Michel, B ;
Biebuyck, H .
JOURNAL OF PHYSICAL CHEMISTRY B, 1998, 102 (18) :3324-3334
[6]   COVALENT BINDING OF PD CATALYSTS TO LIGATING SELF-ASSEMBLED MONOLAYER FILMS FOR SELECTIVE ELECTROLESS METAL-DEPOSITION [J].
DRESSICK, WJ ;
DULCEY, CS ;
GEORGER, JH ;
CALABRESE, GS ;
CALVERT, JM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (01) :210-220
[7]   Formation and patterning of self-assembled monolayers derived from long-chain organosilicon amphiphiles and their use as templates in materials microfabrication [J].
Finnie, KR ;
Haasch, R ;
Nuzzo, RG .
LANGMUIR, 2000, 16 (17) :6968-6976
[8]  
Gu G, 2001, ADV FUNCT MATER, V11, P295, DOI 10.1002/1616-3028(200108)11:4<295::AID-ADFM295>3.0.CO
[9]  
2-2
[10]   Catalytic amplification of the soft lithographic patterning of Si. Nonelectrochemical orthogonal fabrication of photoluminescent porous Si pixel arrays [J].
Harada, Y ;
Li, XL ;
Bohn, PW ;
Nuzzo, RG .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2001, 123 (36) :8709-8717