Growth and structure of Bi0.5(Na0.7K0.2Li0.1)0.5TiO3 thin films prepared by pulsed laser deposition technique

被引：15

作者：

Lu, Lei ^{[1
,2
]}

Mao, Dingquan ^{[1
]}

Lin, Dunmin ^{[1
,3
]}

Zhang, Yongbin ^{[2
]}

Zhu, Jianguo ^{[1
]}

机构：

[1] Sichuan Univ, Sch Mat Sci & Engn, Chengdu 610064, Peoples R China

[2] China Acad Engn Phys, Mianyang 621900, Peoples R China

[3] Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China

来源：

PHYSICA B-CONDENSED MATTER | 2009年 / 404卷 / 02期

基金：

美国国家科学基金会;

关键词：

Bi-0.5(Na0.7K0.2Li0.1)(0.5)TiO3; Pulsed laser deposition; Lead-free piezoelectric thin films;

D O I：

10.1016/j.physb.2008.11.004

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Bi-0.5(Na0.7K0.2Li0.1)(0.5)TiO3 (BNKLT) thin films were prepared on Pt/Ti/SiO2/Si substrates by pulsed laser deposition (PLD) technique. The films prepared were examined by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The effects of the processing parameters, such as oxygen pressure, substrate temperature and laser power, on the crystal structure, surface morphology, roughness and deposition rates of the thin films were investigated. It was found that the substrate temperature of 600 degrees C and oxygen pressure of 30 Pa are the optimized technical parameters for the growth of textured film, and all the thin films prepared have granular structure, homogeneous grain size and smooth surfaces. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：325 / 328

页数：4

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