We have fabricated 13.7%-efficient CuIn1-XGaXSe2 (CIGS)-based devices from electrodeposited precursors. As deposited electrodeposited precursors are Cu-rich films. Additional In, Ga, and Se were added to the electrodeposited precursor film by physical evaporation to adjust the final composition to CuIn1-xGaxSe2. Three devices with Ga/(In+Ga) ratio of 0.16, 0.26, and 0.39 were fabricated from electrodeposited precursors. The films/devices have been characterized by inductive-coupled plasma spectrometry, Auger electron spectroscopy, X-ray diffraction, electron-probe microanalysis, current-voltage characteristics, capacitance-voltage, and spectral response. The electrodeposited device parameters are compared with those of a 17.7% physical vapor deposited device.