High quality diamond like carbon thin film fabricated by ECR plasma CVD

Diamond like carbon (DLC) films have been fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR CVD). Low temperature (less than 70 degrees C) fabrication of the DLC films, with a hardness of more than 3000 Hv and a high deposition rate of more than 80 nm/min, was achieved by applying a bias voltage during deposition to accelerate the ion impinging energy to the substrate. Furthermore, an attempt was made to fabricate ultrathin DLC films for protective coating purposes. Ultrathin DLC films by this method with a thickness of 10 nm exhibited excellent wear characteristics and chemical inertness, indicating their usability as protective coating for electronic devices.